Mutech microlaser direct laser lithography system photomask writer

Description

The writer
Mutech microsystems microlaser is a low cost direct optical lithography system oriented to universities and research facilities looking to expand their capabilities.
It writes on a photosensitive resist coated surface with a 405nm laser on big areas. You can write anything from photomasks to research prototypes for basic or applied science.
We have optimized it for ease of use and low cost fabrication and maintenance, maximizing the use of off-the-shelf parts without sacrificing writing quality nor its capabilities.
Direct laser lithography
Direct laser lithography greatly reduces costs and execution times in areas such as microfluidics, microelectronics, micromechanics and material science research, by eliminating the dependence of external suppliers for the production of photomasks.
The software
Microlaser is delivered with its control software. It allows you to import the designs to be written from cells of GDSII files or directly from PNG images.
Everything is done from a user friendly graphical interface that allows you preview the design to write before executing it.
Multiple designs can be combined in a single process, in addition to applying transformations such as rotations, reflections, inversions or scale adjustments to each design.
After defining the design, the included stage control modules and the confocal microscope are used.
With them you set the origin position of the process on the substrate and the focal plane on the photosensitive surface.
Next the process is executed and the design is written on the surface.
Specs
XY Stage
Typical writing speed                                              100-120 mm/s
Maximum area                                                        100x92 mm^2
Minimum area                                                         There isn’t a minimum area
Unidirectional positioning step                                 X = 0.16 µm, Y = 1.00 µm
Mechanical short range noise on the slow X axis    < 1 µm,
Mechanical long range noise on the fast Y axis       < 1 µm
Multi layer aligning accuracy                                    5-10 µm (Optional rotary stage for easier aligning)
Realistic minimum feature size:  6-15µm depending on the feature (see pictures for examples)
Software
Supported formats                                       PNG,GDSII
In-software transformations                         Rotation, Reflection, Inversion, Rescaling, Add border
-Multiple designs from different files can be written in one process
-Tilted/warped substrate compensation via 3-point linear or 4-point bilinear focus measurement
-Mesh type calibration for full-bed curvature compensation
Optics
-Confocal microscope for laser focusing, aligning and inspection
-Secondary independent yellow illumination
-Laser spot size can be changed using industry standard microscope objectives
Raster step of included objectives:
-Fine:              0.8 µm
-Medium:        2 µm
-Coarse:         5 µm
Effective writing speed of included objectives on big areas (unidirectional writing):
-Fine:              1.7 mm^2/min
-Medium:        4.25 mm^2/min
-Coarse:         10.6 mm^2/min
Speed doubles in bidirectional writing mode.
Shipping and installation
We will ship the microlaser from our headquarters on Argentina. We usually ship with UPS but we can accommodate to your requirements.
A laptop PC with an nvidia gpu is required for the control software and it could be provided if the customer needs it.
(PC not included on the listing price, please ask)
If you need it, we can offer worldwide on-site installation and usage training by one of our technicians or distributors after the writer has arrived to the destination. (not included on the listing price, please ask)
Requirements
This is a high resolution laser writer that works on photosensitive semiconductor grade materials. As such, it works best installed on a clean room with yellow light.
A clean room is not completely mandatory but any dust present in the ambient that deposits on the writing area while the machine is working will disturb the writing process (it will shadow the laser).
The machine includes a lid with a yellow tinted window so it can be installed outside a yellow light room, although a yellow room is recommended for photoresist manipulation.
Also, a pneumatic isolation table is a recommended add-on for the writer. It is not necessary but it avoids external vibrations (i.e. traffic) from disturbing the writing process.
If you need advise or have any doubts on the room requirements please contact us and we will help you make the best choices.
Please contact us to arrange installation, options and shipping details before buying
Optional extras:
375nm laser
Rotary stage for multi-layer aligning
Some writing examples: