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Oxford Instruments 133 ICP with 380 Source - Ion Couple Plasma Etching System
Oxford Instruments 133 ICP with 380 Source - Ion Couple Plasma Etching System
Oxford Instruments 133 ICP with 380 Source - Ion Couple Plasma Etching System
Oxford Instruments 133 ICP with 380 Source - Ion Couple Plasma Etching System
Oxford Instruments 133 ICP with 380 Source - Ion Couple Plasma Etching System
Oxford Instruments 133 ICP with 380 Source - Ion Couple Plasma Etching System
Oxford Instruments 133 ICP with 380 Source - Ion Couple Plasma Etching System
Oxford Instruments 133 ICP with 380 Source - Ion Couple Plasma Etching System
Oxford Instruments 133 ICP with 380 Source - Ion Couple Plasma Etching System
Oxford Instruments 133 ICP with 380 Source - Ion Couple Plasma Etching System
Oxford Instruments 133 ICP with 380 Source - Ion Couple Plasma Etching System

Oxford Instruments 133 ICP with 380 Source - Ion Couple Plasma Etching System

$ 71280

Availability: 100 in stock
  • Country of Manufacture: United Kingdom
  • Country//Region of Manufacture: United Kingdom
  • Brand: Oxford Instruments
  • Condition: System complete recently removed from a production. Can be offered refurbished, installed with a 90 day warranty for an additional fee.
  • All returns accepted: ReturnsNotAccepted
  • Model: 133 ICP

    Description

    Oxford Instruments 133 ICP - Ion
    Couple Plasma Etching System with 380 ICP Source, Manual Load Lock, Ceramic Clamp style ICP system, Alcatel Turbo pump with controller, VAT Gate Valve with PM5 cotroller, Endpoint Detector, RF power supply with match work and tuner, Currently eight Mass Flow Controllers
    Can offer System refurbished, operational or As is, where is. Price listed is "As is, where is" but complete
    Can offer installation & training as well.
    .