RTP-3000 Rapid Thermal Processing Equipment

Description

An Advanced Rapid Thermal Processing System with Multi-Gas Capabilities
The RTP-3000 is a fully automated production system.  The  system with a 200mm chamber is capable of up to 6″ Compound Semiconductor, or with a 300mm chamber up to 12″ Silicon wafer processing.
PROCESSES
Contact alloying
Implant activation
Silicide formation
Nitridation of metals
Oxidation
Glass reflow
FEATURES
Dual-Arm Robot Transport
Dual Cassette Platform
Quartz Processing Chamber
Quartz Wafer Processing Tray
Four-layer Tungsten Halogen Lamp Array Heating
Zone Control with unique lamp arrangement ensures highly uniform heating of up to 12″ Silicon Wafers (300mm chamber) or 8″ Silicon Wafers / 6” GaAs Wafers with 8″ O.D. Susceptor (200mm chamber)
Extended Range Pyrometer Plus (ERP+) internally cooled pyrometer for extended temperature range from 350 – 1250 Degrees C
Electro polished stainless steel (316L) gas plumbing with VCR Connectors
MFC controlled gas lines, up to ten (10) gas lines available.
TEMPERATURE CONTROL
The RTP-3000 System features a loop temperature control algorithim with a temperature control stability of +/- 2 deg. C from set point. This feature greatly simplifies programming complex multi-step cycles, since no “tweaking” of system variables is required. The Lamp Calibration feature allows user-optimization of heating uniformity. Software diagnostics are provided to monitor each lamp and compensate for lamp aging effects.
TEMPERATURE MEASUREMENT
The temperature measurement techniques available for the RTP-3000 system are thermocouple, pyrometer. The type-K thermocouple is useful for low-temperature processing and calibrating the pyrometer. The Extended Range Pyrometer Plus (ERP+) internally cooled pyrometer can be used to measure wafer temperatures in the range of 350-1250 deg. C. (Actual range depends upon process, wafer type and system configuration.)
SOFTWARE
An integrated software package has been developed to control the RTP-3000 System. The software modules interactively serve to integrate the various functions and operations of this system. Software features allow convenient recipe creation and editing. Process data may be collected during a run cycle and stored in a data file for later display and analysis. The process and recipe data files can be internally stored as DIF (Data Interchange Format) which can be imported into popular software packages such as Lotus 1-2-3, as a worksheet for display, plotting and further analysis.
RTP-3000 Software Features
Real-Time Process Control
Real-Time Graphics Display
Real-Time Process Data Collection
Recipe Editor
Recipe Validation
Process Data File Management
Process Data File Display and Analysis
System Diagnostics
System Configuration Utilities
The valid time is subject to prior sale without notice.